- Microstructure of highly crystalline silicon carbide thin films grown by HWCVD technique
- Low temperature amorphous silicon carbide thin film formation process on aluminum surface using monomethylsilane gas and trichlorosilane gas
- Simulation of electron channelling patterns for in situ polytype analysis of silicon carbide films
- Chemically vapor-deposited silicon carbide films for surface protection
- Infra-red, X-ray photoelectron spectroscopy and electrical studies of r.f. sputtered amorphous silicon carbide films
- Crystallization mechanism of silicon quantum dots upon thermal annealing of hydrogenated amorphous Si-rich silicon carbide films
- X-ray absorption study of silicon carbide thin film deposited by pulsed laser deposition
- Characterisation of silicon carbide films deposited by plasma-enhanced chemical vapour deposition
- Fabrication of amorphous silicon carbide films using VHF-PECVD for triple-junction thin-film solar cell applications
- Effects of substrate temperature on microstructural and photoluminescent properties of nanocrystalline silicon carbide films