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Home > News > Fabrication of nanocrystalline silicon carbide thin film by helicon wave plasma enhanced chemical vapour deposition
Fabrication of nanocrystalline silicon carbide thin film by helicon wave plasma enhanced chemical vapour deposition
Nanocrystalline cubic silicon carbide thin films have been fabricated by helicon wave plasma enhanced chemical vapour deposition on Si substrates using the mixture of SiH4, CH4, and H2 at a low substrate temperature of 300 °C. The infrared absorption spectroscopy analyses and microstructural characteristics of the samples deposited at various magnetic fields indicate that the high plasma intensity in helicon wave mode is a key factor to the success of growing nanocrystalline silicon carbide thin films at a relative low substrate temperature. Transmission electron microscopy measurements reveal that the films consist of silicon carbide nanoparticles with an average grain size of several nanometers, and the light emission measurements show a strong blue photoluminescence at room temperature, which is considered to be caused by the quantum confine effect of small size silicon carbide nanoparticles.
 
Source: Thin Solid Films
 
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